Brief description of the product/ process/ service

1. ZnO (Zinc Oxide) Sputtering Target Composition: High-purity ZnO, often ≥99.99% Properties: Wide bandgap (~3.3 eV), good transparency, and excellent electrical conductivity (when doped). Applications: Transparent conductive films (TCOs) Thin-film transistors (TFTs) Solar cells Gas sensors and UV detectors 2. TiO₂ (Titanium Dioxide) Sputtering Target Composition: High-purity TiO₂, typically in rutile or anatase form. Properties: Wide bandgap (~3.0–3.2 eV), high dielectric constant, excellent photocatalytic activity. Applications: Optical coatings and antireflective layers Photocatalysts Self-cleaning surfaces Dielectric layers in capacitors 3. CuO (Copper Oxide) Sputtering Target Composition: High-purity CuO, typically ≥99.9% Properties: Narrow bandgap (~1.2–1.9 eV), p-type semiconductor, good thermal stability. Applications: Photovoltaic and photoelectrochemical cells Supercapacitors and batteries Gas sensors and antimicrobial coatings